Predictive Modelling of Etching Process of Machinable Glass Ceramics, Boron Nitride, and Silicon Carbide

Huey Tze Ting, Khaled Abou-El-Hossein, Han Bing Chua
DOI: 10.4236/msa.2011.211214                

Abstract

The present paper discusses the development of the first and second order model for predicting the chemical etching variables, namely, etching rate, surface roughness and accuracy of advanced ceramics. The first and second order etching rate, surface roughness and accuracy equations were developed using the Response Surface Method (RSM). The etching variables included etching temperature, etching duration, solution and solution concentration. The predictive models’ analyses were supported with the aid of the statistical software package – Design Expert (DE 7). The effects of the individual etching variables and interaction between these variables were also investigated. The study showed that predictive models successfully predicted the etching rate, surface roughness and accuracy readings recorded experimentally with 95% confident interval. The results obtained from the predictive models were also compared with Multilayer Perceptron Artificial Neural Network (ANN). Chemical Etching variables predictive by ANN were in good agreement with those with those obtained by RSM. This observation indicated the potential of ANN in predicting chemical etching variables thus eliminating the need for exhaustive chemical etching in optimization.

Keywords

Chemical Etching, Machinable Glass Ceramic, Boron Nitride, Silicon Carbide, RSM, ANN

Conflicts of Interest

The authors declare no conflicts of interest.

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