Share This Article:

Characteristics and Operation Conditions of a Closed-Field Unbalanced Dual Magnetrons Plasma Sputtering System

Abstract PP. 1-7
DOI: 10.4236/oalib.1100650    1,433 Downloads   1,821 Views   Citations

ABSTRACT

In this work, a home-made closed-field unbalanced magnetron system for plasma sputtering purposes was constructed and operated. The effect of magnetron was introduced by comparing the obtained Paschen’s curve in existence of magnetron with and without magnetron. Characterization of Paschen’s curve as well as discharge current with gas pressure at different distances between the discharge electrodes was introduced. Optimum conditions to operate such home-made system for sputtering purpose were determined.

Conflicts of Interest

The authors declare no conflicts of interest.

Cite this paper

Chiad, B. , Khalaf, M. , Kadhim, F. and Hammadi, O. (2014) Characteristics and Operation Conditions of a Closed-Field Unbalanced Dual Magnetrons Plasma Sputtering System. Open Access Library Journal, 1, 1-7. doi: 10.4236/oalib.1100650.

References

[1] McClanahan, E.D. and Laegreid, N. (1991) Production of Thin Films by Controlled Deposition of Sputtered Material. Topics in Applied Physics, 64, 339-377.
http://dx.doi.org/10.1007/3540534288_21
[2] Rademacher, D., Zickenrott, T. and Vergöhl, M. (2013) Sputtering of Dielectric Single Layers by Metallic Mode Reactive Sputtering and Conventional Reactive Sputtering from Cylindrical Cathodes in a Sputter-Up Configuration. Thin Solid Films, 532, 98-105.
http://dx.doi.org/10.1016/j.tsf.2012.11.101
[3] Baek, J.-S. and Kim, Y.J. (2006) Cooling Effect Enhancement in Magnetron Sputtering System. 5th International Conference on CFD in the Process Industries CSIRO, Melbourne, 13-15 December 2006, 1-5.
[4] Kelly, P.J. and Arnell, R.D. (2000) Magnetron Sputtering: A Review of Recent Developments and Applications. Vacuum, 56, 159-172.
http://dx.doi.org/10.1016/S0042-207X(99)00189-X
[5] Arnell, R.D. and Kelly, P.J. (1999) Recent Advances in Magnetron Sputtering. Surface and Coatings Technology, 112, 170-176.
http://dx.doi.org/10.1016/S0257-8972(98)00749-X
[6] Walkowicz, J., Zykov, A., Dudin, S. and Yakovin, S. (2006) ICP Enhanced Reactive Magnetron Sputtering System for Synthesis of Alumina Coatings. Tribologia, 6, 163-174.
[7] Ashenford, D.E., Long, F., Hagston, W.E., Lunn, B. and Matthews, A. (1999) Experimental and Theoretical Studies of the Low-Temperature Growth of Chromia and Alumina. Surface and Coatings Technology, 116-119, 699-704.
http://dx.doi.org/10.1016/S0257-8972(99)00181-4
[8] Sigmund, P. (1981) Topics in Applied Physics, Vol. 47. Sputtering by Particle Bombardment I. Springer-Verlag, Berlin.
[9] Taherkhani, F. and Taherkhani, A. (2010) Surface Characterization of Through Cage Plasma Nitriding on the Surface Properties of Low Alloy Steel. Transaction B: Mechanical Engineering, 17, 253-263.
[10] Wehner, G.K. and Anderson, G.S. (1983) Vacuum Technology, Thin Films and Sputtering: An Introduction. Academic Press, New York.
[11] Bogaerts, A., Neyts, E., Gijbels, R. and van der Mullen, J. (2002) Gas Discharge Plasmas and Their Applications (Review). Spectrochimica Acta Part B, 57, 609-658.
http://dx.doi.org/10.1016/S0584-8547(01)00406-2
[12] Kotp, E.F. and Al-Ojeery, A.A. (2012) Studies the Effect of Magnetic Field on Argon Plasma Characteristics. Australian Journal of Basic and Applied Sciences, 6, 817-825.
[13] Personick, S.D. (1971) Statistics of a General Class of Avalanche Detectors with Applications to Optical Communications. Bell System Technical Journal, 50, 3075-3095.
http://dx.doi.org/10.1002/j.1538-7305.1971.tb01847.x
[14] Wang, J.-C., Leoni, N., Birecki, H., Gila, O. and Kushner, M.J. (2013) Electron Current Extraction from Radio Frequency Excited Micro-Dielectric Barrier Discharges. Journal of Applied Physics, 113, Article ID: 033301.
[15] Window, B. and Savvides, N. (1986) Charged Particle Fluxes from Planar Magnetron Sputtering Sources. Journal of Vacuum Science & Technology A, 4, 196.
http://dx.doi.org/10.1116/1.573470
[16] Makabe, T. and Petrovic, Z. (2006) Plasma Electronics: Applications in Microelectronic Device Fabrication. Taylor & Francis, New York, 301.

  
comments powered by Disqus

Copyright © 2019 by authors and Scientific Research Publishing Inc.

Creative Commons License

This work and the related PDF file are licensed under a Creative Commons Attribution 4.0 International License.