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Electrodeposition of Gold to Conformally Fill High-Aspect-Ratio Nanometric Silicon Grating Trenches: A Comparison of Pulsed and Direct Current Protocols

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DOI: 10.4236/jsemat.2015.54022    3,982 Downloads   4,452 Views   Citations

ABSTRACT

Filling high-aspect-ratio trenches with gold is a frequent requirement in the fabrication of X-ray optics as well as micro-electronic components and other fabrication processes. Conformal electrodeposition of gold in sub-micron-width silicon trenches with an aspect ratio greater than 35 over a grating area of several square centimeters is challenging and has not been described in the literature previously. A comparison of pulsed plating and constant current plating led to a gold electroplating protocol that reliably filled trenches for such structures.

Conflicts of Interest

The authors declare no conflicts of interest.

Cite this paper

Znati, S. , Chedid, N. , Miao, H. , Chen, L. , Bennett, E. and Wen, H. (2015) Electrodeposition of Gold to Conformally Fill High-Aspect-Ratio Nanometric Silicon Grating Trenches: A Comparison of Pulsed and Direct Current Protocols. Journal of Surface Engineered Materials and Advanced Technology, 5, 207-213. doi: 10.4236/jsemat.2015.54022.

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