Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Layer at Room-Temperature

Satoshi Yamauchi, Hiromi Suzuki, Risa Akutsu

Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan..

DOI: 10.4236/jcpt.2014.41003                

Abstract

Plasma-assisted chemical vapor deposition (PCVD) at pressure as low as 3 mtorr using titanium-tetra-isopropoxide (TTIP) and oxygen mixed gas plasma generated by 13.56 MHz radio frequency power (RF-power) below 70 W were applied to deposit titanium-oxide layer at temperature under 40°C. Plasma optical emission spectroscopy and FTIR indicated that density of OH group in the amorphous layer was related to the density of OH or H₂O in the plasma and the species was formed on electrode to induce the RF-power. Hydrophilicity on the layer was dependent on the density of chemisorbed OH, but was degraded by the excess OH. The PCVD-TiO_x coating was demonstrated on polyethylene terephthalate and showed good hydrophilic property with the contact angle of water about 5°.

Keywords

PCVD; Amorphous Titanium-Oxide; FTIR; Hydroxyl; Hydrophilicity

Conflicts of Interest

The authors declare no conflicts of interest.

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