Temporal Evolution of Anodization Current of Porous Silicon Samples

Adriana Gutiérrez, Jairo Giraldo, Mario Enrique Rodríguez-García

Centro de Física Aplicada y Tecnología Avanzada, Universidad Nacional Autónoma de México, Querétaro, México.
Departamento de Física, Universidad Nacional de Colombia-Sede Bogotá, Ciudad Universitaria, Bogotá DC, Colombia.
Departamento de Física, Universidad Nacional de Colombia-Sede Bogotá, Ciudad Universitaria, Bogotá DC, Colombia; Departamento de Física, Universidad Militar Nueva Granada, Bogotá DC, Colombia.

DOI: 10.4236/msa.2013.48A005                

Abstract

Temporal evolution of the anodization current of porous silicon samples was studied by means of a model of resistances connected in series that represented the temporal changes of the substrate and of the interface between the substrate and the electrolyte during the porous sample formation process. The porous samples were obtained by means of photoelectrochemical etching of (100) n-type silicon wafers with different resistivity values, all in the range of 1 - 25 Wcm. The samples were formed at room temperature in an electrolytic bath composed by a mixture of hydrofluoric acid (48%) and ethanol having a composition ratio of 1:1 in volume under potentiostatic condition (10 V and 20 V) and an etching time of 2 minutes using back illumination provided by a laser beam with a wavelength of 808 nm.

Keywords

Porous Silicon; Electrochemical Etching; Anodization Current

Conflicts of Interest

The authors declare no conflicts of interest.

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