The Design and Manufacturing of Diffraction Optical Elements to form a Dot-Composed Etalon Image within the Optical Systems


The possibilities of manufacturing of diffraction optical elements (DOE), using the “Caroline 15 PE” plasma-etching machine were considered. It is established that at thickness of chromic mask of 100 nm the plasma-chemical etching (PCE) method reaches depth of surface micro-profile to 1.4 μm on optical glass. It allows increasing the diffraction efficiency of DOE to 0.3 - 0.35 on the second order of diffraction.

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S. Odinokov and H. Sagatelyan, "The Design and Manufacturing of Diffraction Optical Elements to form a Dot-Composed Etalon Image within the Optical Systems," Optics and Photonics Journal, Vol. 3 No. 1, 2013, pp. 102-111. doi: 10.4236/opj.2013.31017.

Conflicts of Interest

The authors declare no conflicts of interest.


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