Author(s)

Sri Vidawati¹, Jürgen W. Gerlach², Benjamin Herold², Bernd Rauschenbach²

¹Faculty of Post Graduate, National Institute of Science and Technology, Jakarta 12640, Indonesia.
²Leibniz Institute of Surface Engineering (IOM), Permoserstrasse 15, D-04318 Leipzig, Germany.

The Epitaxial GaN thin films have been fabricated by Ion Beam Assisted Deposition (IBAD) process using nitrogen ions with hyperthermal energies on the polyimides polymer substrates. By applying with the Reflection of High-Energy Electron Diffraction (RHEED), Scanning Electron Microscopy (SEM) and Quantum Design Physical Properties Measurement System, the behaviour of hexagonal GaN thin films is investigated. The result showed that the high quality of the deposited GaN layers kept appearing for many parameters depending on the temperature greatly. The behaviour of high quality of epitaxial GaN coating on the polyimide polymer substrates is a promising material for optoelectronic devices and semiconductor devices application.

Ion Beam Assisted Deposition, Hexagonal GaN Thin Film, SEM, Quantum Design Physical Properties Measurement System, RHEED

Vidawati, S. , Gerlach, J. , Herold, B. and Rauschenbach, B. (2020) Structural Characterization of Thin Epitaxial GaN Films on Polymer Polyimides Substrates by Ion Beam Assisted Deposition. Advances in Materials Physics and Chemistry, 10, 199-206. doi: 10.4236/ampc.2020.109015.