Journal of Materials Science and Chemical Engineering

Volume 4, Issue 10 (October 2016)

ISSN Print: 2327-6045   ISSN Online: 2327-6053

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ZnO Films Deposited on Glass by Means of DC Sputtering

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DOI: 10.4236/msce.2016.410001    1,172 Downloads   1,590 Views   Citations

ABSTRACT

ZnO films were deposited on glass substrates by means of a direct current (DC) sputtering technique. The physical properties of the films were investigated on the basis of X-ray diffraction measurements. It was found that as-deposited films show c-axis oriented crystal normal to the surface with the extension of c axis by 1.27% that is estimated from the shift of the peak in the X-ray diffraction pattern. Post-deposition annealing in air at higher than 400 eliminates the shift and sharpens the diffraction peak structure at the same time. The electrical resistivity continues to decrease from 500 Ωcm down to 0.6 Ωcm by annealing as high as 600.

Cite this paper

Ohmukai, M. , Nakagawa, T. and Matsumoto, A. (2016) ZnO Films Deposited on Glass by Means of DC Sputtering. Journal of Materials Science and Chemical Engineering, 4, 1-7. doi: 10.4236/msce.2016.410001.

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