Preparation of Cr2O3-Ta2O5 Composites Using RF Magnetron Sputtering ()
ABSTRACT
We prepared Cr2O3-Ta2O5 composite films using our RF magnetron co-sputtering method for the first time.
X-ray diffraction (XRD) patterns and photoluminescence (PL) spectra of the
films annealed at 700℃, 800℃, 900℃, and 1000℃ were evaluated. From their XRD
patterns, the Cr2O3-Ta2O5 film
annealed at 700℃ seemed to be
almost amorphous, and the one annealed at 800℃ seemed to be hexagonal Ta2O5 doped with Cr. In
addition, the Cr2O3-Ta2O5 films
annealed at 900℃ and 1000℃ seemed to include tetragonal CrTaO4 phases. Furthermore, it
seems that almost no defect exists in our Cr2O3-Ta2O5 composite films annealed at 700℃ - 1000℃ because their PL spectra have no
defect-related peak. We thus find that good-quality Cr2O3-Ta2O5 composite films including CrTaO4 can be obtained
using our very simple co-sputtering method and subsequent annealing above
900℃.
Share and Cite:
Miura, K. , Osawa, T. , Yokota, Y. and Hanaizumi, O. (2015) Preparation of Cr
2O
3-Ta
2O
5 Composites Using RF Magnetron Sputtering.
Open Access Library Journal,
2, 1-5. doi:
10.4236/oalib.1102094.
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