ATR-FTIR and XPS Evaluation of Alkyl Immobilization by Hydrosilylation on n-Si(111) for Photoelectrochemical Cell Electrode - Journal of Surface Engineered Materials and Advanced Technology

JSEMAT > Vol.3 No.3, September 2013

Journal of Surface Engineered Materials and Advanced Technology

Volume 3, Issue 3 (September 2013)

ISSN Print: 2161-4881 ISSN Online: 2161-489X

Google-based Impact Factor: 0.29 Citations

ATR-FTIR and XPS Evaluation of Alkyl Immobilization by Hydrosilylation on n-Si(111) for Photoelectrochemical Cell Electrode ()

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DOI: 10.4236/jsemat.2013.33A002 4,865 Downloads 6,798 Views Citations

Author(s)

Toshihito Ohtake

Affiliation(s)

Department of Mechanical Systems Engineering, Faculty of Engineering, Aich University of Technology, Gamagori, Japan..

ABSTRACT

An electrode development was needed with high efficiency and low costs as next generation solar cells. We attempted the electrode fabrication for a photoelectrochemical cell by immobilizing functional groups on a n-Si(111) surface. The immobilization was applied by hydrosilylation terminated with ester (hydrophobic) or carbonyl (hydrophilic) group. Results confirmed the immobilization on the Si surface by measuring ATR-FTIR and XPS.

KEYWORDS

ATR-FTIR; XPS; Si Surface; Hydrosilylation; Immobilization; Photoelectrochemical Cell

Share and Cite:

Ohtake, T. (2013) ATR-FTIR and XPS Evaluation of Alkyl Immobilization by Hydrosilylation on n-Si(111) for Photoelectrochemical Cell Electrode. Journal of Surface Engineered Materials and Advanced Technology, 3, 7-10. doi: 10.4236/jsemat.2013.33A002.

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