Antiferroelectricity in ZrO<sub>2</sub> and Ferroelectricity in Zr, Al, La Doped HfO<sub>2</sub> Nanoparticles

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ISSN Print: 2162-531X
ISSN Online: 2162-5328
www.scirp.org/journal/ampc
E-mail: ampc@scirp.org

"Antiferroelectricity in ZrO₂ and Ferroelectricity in Zr, Al, La Doped HfO₂ Nanoparticles"
written by A. T. Apostolov, I. N. Apostolova, J. M. Wesselinowa,
published by Advances in Materials Physics and Chemistry, Vol.10 No.2, 2020

has been cited by the following article(s):

[1]	Excellent Reliability and High-Speed Antiferroelectric HfZrO2 Tunnel Junction by a High-Pressure Annealing Process and Built-In Bias Engineering
	2020

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[1]	Excellent Reliability and High-Speed Antiferroelectric HfZrO2 Tunnel Junction by a High-Pressure Annealing Process and Built-In Bias Engineering ACS Applied Materials & Interfaces, 2020 DOI:10.1021/acsami.0c15091

[2]	Excellent Reliability and High-Speed Antiferroelectric HfZrO2 Tunnel Junction by a High-Pressure Annealing Process and Built-In Bias Engineering ACS Applied Materials & Interfaces, 2020 DOI:10.1021/acsami.0c15091