Catalyst-Free Growth of Graphene by Microwave Surface Wave Plasma Chemical Vapor Deposition at Low Temperature

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ISSN Print: 2327-6045
ISSN Online: 2327-6053
www.scirp.org/journal/msce
E-mail: msce@scirp.org

"Catalyst-Free Growth of Graphene by Microwave Surface Wave Plasma Chemical Vapor Deposition at Low Temperature"
written by Sudip Adhikari, Hare Ram Aryal, Hideo Uchida, Masayoshi Umeno,
published by Journal of Materials Science and Chemical Engineering, Vol.4 No.3, 2016

has been cited by the following article(s):

[1]	A review of graphene synthesisatlow temperatures by CVD methods
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[2]	低温 CVD 法制备石墨烯的研究进展
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[3]	Single-step growth of graphene and graphene-based nanostructures by plasma-enhanced chemical vapour deposition
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[4]	Direct CVD growth of graphene on technologically important dielectric and semiconducting substrates
	2018

[5]	A catalytic, catalyst-free, and roll-to-roll production of graphene via chemical vapor deposition: Low temperature growth
	Carbon, 2018

[6]	Low temperature plasma enchanced chemical vapor deposition of graphene layers
	2017

[7]	A review of surface engineering of Graphene for electrochemical sensing applications
	2017

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