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Lowest Concentration of Chlorine Trifluoride Gas for Cleaning Silicon Carbide Chemical Vapor Deposition Reactor
ECS Journal of Solid State Science and Technology,
2022
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Anticorrosive Behavior of Aluminum Nitride Surface Exposed to Chlorine Trifluoride Gas at High Temperatures
ECS Journal of Solid State Science and Technology,
2021
DOI:10.1149/2162-8777/abea5d
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Chemical Conditions of SiCNO Film Exposed to ClF3 Gas
ECS Journal of Solid State Science and Technology,
2021
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Anticorrosive Behavior of SiCxNyOz Film Formed by Non-Heat Assistance Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane, Nitrogen and Argon Gases
ECS Journal of Solid State Science and Technology,
2020
DOI:10.1149/2162-8777/ab6161
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Design of a Silicon Carbide Chemical Vapor Deposition Reactor Cleaning Process Using Chlorine Trifluoride Gas Accounting for Exothermic Reaction Heat
ECS Journal of Solid State Science and Technology,
2020
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SiC Epitaxial Reactor Cleaning by ClF3 Gas with the Help of Reaction Heat
Materials Science Forum,
2020
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Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques
2019
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Exposure of Tantalum Carbide, Silicon Nitride and Aluminum Nitride to Chlorine Trifluoride Gas
ECS Journal of Solid State Science and Technology,
2019
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High-Temperature Reactor Cleaning Using Chlorine Trifluoride Gas for Silicon Carbide Chemical Vapor Deposition
ECS Journal of Solid State Science and Technology,
2019
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High Temperature SiC Reactor Cleaning Using Chlorine Trifluoride Gas Achieved by Purified Pyrolytic Carbon Coating Film
Materials Science Forum,
2019
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Quick and Practical Cleaning Process for Silicon Carbide Epitaxial Reactor
Materials Science Forum,
2018
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Quick Cleaning Process for Silicon Carbide Chemical Vapor Deposition Reactor
ECS Journal of Solid State Science and Technology,
2017
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