Journal of Surface Engineered Materials and Advanced Technology

Journal of Surface Engineered Materials and Advanced Technology

ISSN Print: 2161-4881
ISSN Online: 2161-489X
www.scirp.org/journal/jsemat
E-mail: jsemat@scirp.org
"Metal Fluorides Produced Using Chlorine Trifluoride Gas"
written by Hitomi Matsuda, Hitoshi Habuka, Yuuki Ishida, Toshiyuki Ohno,
published by Journal of Surface Engineered Materials and Advanced Technology, Vol.5 No.4, 2015
has been cited by the following article(s):
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[1] Lowest Concentration of Chlorine Trifluoride Gas for Cleaning Silicon Carbide Chemical Vapor Deposition Reactor
ECS Journal of Solid …, 2022
[2] Chemical Conditions of SiCNO Film Exposed to ClF3 Gas
ECS Journal of Solid State …, 2021
[3] Anticorrosive Behavior of Aluminum Nitride Surface Exposed to Chlorine Trifluoride Gas at High Temperatures
2021
[4] SiC Epitaxial Reactor Cleaning by ClF3 Gas with the Help of Reaction Heat
2020
[5] Design of a Silicon Carbide Chemical Vapor Deposition Reactor Cleaning Process Using Chlorine Trifluoride Gas Accounting for Exothermic Reaction Heat
2020
[6] Anticorrosive Behavior of SiC x N y O z Film Formed by Non-Heat Assistance Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane, Nitrogen and …
2020
[7] High-Temperature Reactor Cleaning Using Chlorine Trifluoride Gas for Silicon Carbide Chemical Vapor Deposition
2019
[8] Applications of Gas-Phase Cleaning for Removal of Surface Contaminants
2019
[9] Exposure of Tantalum Carbide, Silicon Nitride and Aluminum Nitride to Chlorine Trifluoride Gas
2019
[10] High Temperature SiC Reactor Cleaning Using Chlorine Trifluoride Gas Achieved by Purified Pyrolytic Carbon Coating Film
2019
[11] Quick and Practical Cleaning Process for Silicon Carbide Epitaxial Reactor
Materials Science Forum, 2018
[12] Yttrium oxide film for protecting quartz glass surface from etching by long-term exposure to chlorine trifluoride gas at room temperature
Materials Science in Semiconductor Processing, 2018
[13] Yttrium Oxide Film for Protecting Quartz Glass Surface from Etching by Long-Term
Dissertation, 2018
[14] Gas-Phase Cleaning for Removal of Surface Contaminants
Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning, 2017
[15] Quick Cleaning Process for Silicon Carbide Chemical Vapor Deposition Reactor
2017
[16] Susceptor coating materials applicable for SiC reactor cleaning
2016
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