World Journal of Nano Science and Engineering

World Journal of Nano Science and Engineering

ISSN Print: 2161-4954
ISSN Online: 2161-4962
www.scirp.org/journal/wjnse
E-mail: wjnse@scirp.org
"Role of Chromium Intermediate Thin-Film on the Growth of Silicon Oxide (SiOx) Nanowires"
written by Anima Johari, Anoopshi Johari, Vikas Rana, M. C. Bhatnagar,
published by World Journal of Nano Science and Engineering, Vol.4 No.1, 2014
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