Advances in Materials Physics and Chemistry

Advances in Materials Physics and Chemistry

ISSN Print: 2162-531X
ISSN Online: 2162-5328
www.scirp.org/journal/ampc
E-mail: ampc@scirp.org
"Characterization and Structural Property of Indium Tin Oxide Thin Films"
written by Ehsan Parsianpour, Davood Raoufi, Mojtaba Roostaei, Bahram Sohrabi, Feridoun Samavat,
published by Advances in Materials Physics and Chemistry, Vol.7 No.2, 2017
has been cited by the following article(s):
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[11] Realizing the Potential of RF-Sputtered Hydrogenated Fluorine-Doped Indium Oxide as an Electrode Material for Ultrathin SiOx/Poly-Si Passivating Contacts
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[12] Indium tin oxide thin films: an ideal transparent and conductive oxides contact for solar cells application
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[13] Laser Induced Damage Threshold of Ta2O5 and Ta2O5/SiO2 Films at 532 and 1064 nm
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[14] Effect of Tungsten Doping on the Properties of In2O3 Films
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[15] High-Mobility Hydrogenated Fluorine-Doped Indium Oxide Film for Passivating Contacts c-Si Solar Cells
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[16] Tuning optical properties of ITO films grown by rf sputtering: Effects of oblique angle deposition and thermal annealing
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