"Low Resistive TiO2 Deposition by LPCVD Using TTIP and NbF5 in Hydrogen-Ambient"
written by Satoshi Yamauchi, Kazuhiro Ishibashi, Sakura Hatakeyama,
published by Journal of Crystallization Process and Technology, Vol.5 No.1, 2015
has been cited by the following article(s):
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