Journal of Modern Physics

Journal of Modern Physics

ISSN Print: 2153-1196
ISSN Online: 2153-120X
www.scirp.org/journal/jmp
E-mail: jmp@scirp.org
"Pulsed Supermagnetron Plasma CVD of a-CNx:H Electron-Transport Films for Au/a-CNx:H/p-Si Photovoltaic Cells"
written by Haruhisa Kinoshita, Hiroyuki Suzuki,
published by Journal of Modern Physics, Vol.2 No.5, 2011
has been cited by the following article(s):
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[1] Fowler-Nordheim Tunneling, Photovoltaic Applications and New Band Structure Models of Electroconductive a-CNx: H Films Formed by Supermagnetron …
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[2] Fowler-Nordheim Tunneling, Photovoltaic Applications and New Band Structure Models of Electroconductive a-CNx: H Films Formed by Supermagnetron …
2016
[3] Fowler-Nordheim Tunneling, Photovoltaic Applications and New Band Structure Models of Electroconductive a-CNx:H Films Formed by Supermagnetron …
2016
[4] A Revival of Waste: Atmospheric Pressure Nitrogen Plasma Jet Enhanced Jumbo Silicon/silicon Carbide Composite in Lithium Ion Batteries
ACS applied materials & interfaces, 2015
[5] Chemical vapor deposition of a-CNx: H films for electron field emission using band supermagnetron plasma
Journal of Physics: Conference Series, 2014
[6] Deposition of a-CNx: H Films Using Uniform Supermagnetron Plasma under a Stationary Magnet Field
Journal of Modern Physics, 2013
[7] Deposition of a-CN x: H Films Using Uniform Supermagnetron Plasma under a Stationary Magnet Field
2013
[8] N2 or H2/Isobutane Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous CNx Films for Application to Elementary Amorphous CNx: H/p- …
Japanese Journal of Applied Physics, 2013
[9] N2 or H2/Isobutane Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous CNx Films for Application to Elementary Amorphous CNx: H/p-Si Photovoltaic Cell
Japanese Journal of Applied Physics, 2013
[10] Deposition of a-CNx:H Films Using Uniform Supermagnetron Plasma under a Stationary Magnet Field
2013
[11] N2 or H2/Isobutane Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous CNx Films for Application to Elementary Amorphous CNx: H/p …
2013
[12] Isobutane/N2 Pulsed Radio Frequency Magnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films for Field Emission …
2012
[13] Deposition of amorphous carbon films using Ar and/or N2 magnetron sputter with ring permanent magnet
2012
[14] Isobutane/N2 Pulsed Radio Frequency Magnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films for Field Emission …
Japanese Journal of Applied Physics, 2012
[15] Deposition of amorphous carbon films using Ar and/or N< sub> 2 magnetron sputter with ring permanent magnet
Thin Solid Films, 2012
[16] Isobutane/N2 Pulsed Radio Frequency Magnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films for Field Emission Applications
Japanese Journal of Applied Physics, 2012
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