Effect of Nitriding Current Density on the Surface Properties and Crystallite Size of Pulsed Plasma-Nitrided AISI 316L

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DOI: 10.4236/msce.2015.31007    4,332 Downloads   5,635 Views  Citations

ABSTRACT

In this work, plasma-nitrided AISI 316L stainless steel samples were performed by ion nitriding process under pulsed direct current (DC) discharge at different current densities (1 to 2.5 mA/ cm2). The effect of nitriding current density on the size of crystalline coherently diffracting domains (crystallite size) and strain grade was investigated using X-ray diffraction (XRD) coupled with Williamson-Hall method. Additionally, hardness and wear resistance of the nitriding layer were characterized using a Vickers indenter and pin-on-disk technique respectively. Results showed a decrease in crystallite size from 99 nm for untreated samples to 1.4 nm for samples nitrided at 2.5 mA/cm2 promoted both: an increase in hardness from 226 HV25g to 1245 HV25g, and a considerably decrease in volume loss by wear effect.

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Díaz-Guillén, J. , Granda-Gutiérrez, E. , Vargas-Gutiérrez, G. , Díaz-Guillén, M. , Aguilar-Martínez, J. and Álvarez-Contreras, L. (2015) Effect of Nitriding Current Density on the Surface Properties and Crystallite Size of Pulsed Plasma-Nitrided AISI 316L. Journal of Materials Science and Chemical Engineering, 3, 45-51. doi: 10.4236/msce.2015.31007.

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