CSTA> Vol.2 No.1, March 2013

Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan
Department of Electric and Electronic Engineering, Ibaraki University, Hitachi, Japan

 

Copyright © 2013 Satoshi Yamauchi, Yoh Imai et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

 

How to Cite this Article

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Yamauchi, S. and Imai, Y. (2013) Plasma-Assisted Chemical Vapor Deposition of TiO₂ Thin Films for Highly Hydrophilic Performance. Crystal Structure Theory and Applications, 2, 1-7. doi: 10.4236/csta.2013.21001.

 

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