JMP> Vol.2 No.9, September 2011

 

Copyright © 2011 S. Djerourou, K. Henda, M. Djebli et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

 

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S. Djerourou, K. Henda and M. Djebli, "The Effect of a Multihollow Cathode on the Self-Bias Voltage of Methane RF Discharge Used for a-C:H Deposition," Journal of Modern Physics, Vol. 2 No. 9, 2011, pp. 954-957. doi: 10.4236/jmp.2011.29113.

 

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