Nanostructure of Rutile TiO2 Thin Films Prepared on Unheated Substrate by Dual Cathode DC Unbalanced Magnetron Sputtering

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DOI: 10.4236/msa.2019.103018    846 Downloads   2,224 Views  Citations

ABSTRACT

In this work, structural and optical properties of the TiO2 films deposited on unheated substrates by dual cathode dc unbalanced magnetron sputtering at long substrate-target distance (ds-t) were studied. Titanium dioxide (TiO2) thin films were deposited on unheated Si (110) wafers, glass slides and carbon coated copper grids at different substrate to target (ds-t) distances. The structural properties of TiO2 thin films were characterized by X-ray diffraction (XRD) and transmission electron microcopy (TEM) with selected-area electron diffraction (SAED), surface morphology using atomic force microscopy (AFM) and optical transmission spectra using a spectrophotometer. XRD results show that TiO2 films deposited at various ds-t distances have only rutile crystal structure. The crystallinity and thickness of the films increased while the roughness decreased with decreasing ds-t distance. The refractive indices of the deposited films were found to be in the range of 2.51 - 2.82 and increased with decreasing ds-t distance.

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Kongsri, W. , Limsuwan, S. , Chaiyakun, S. , Limsuwan, P. and Kedkaew, C. (2019) Nanostructure of Rutile TiO2 Thin Films Prepared on Unheated Substrate by Dual Cathode DC Unbalanced Magnetron Sputtering. Materials Sciences and Applications, 10, 216-226. doi: 10.4236/msa.2019.103018.

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