Characterization of Thin Films by Low Incidence X-Ray Diffraction


Glancing Angle X-ray Diffraction (GAXRD) is introduced as a direct, non-destructive, surface-sensitive technique for analysis of thin films. The method was applied to polycrystalline thin films (namely, titanium oxide, zinc selenide, cadmium selenide and combinations thereof) obtained by electrochemical growth, in order to determine the composition of ultra-thin surface layers, to estimate film thickness, and perform depth profiling of multilayered heterostructures. The experimental data are treated on the basis of a simple absorption-diffraction model involving the glancing angle of X-ray incidence.

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Bouroushian, M. and Kosanovic, T. (2012) Characterization of Thin Films by Low Incidence X-Ray Diffraction. Crystal Structure Theory and Applications, 1, 35-39. doi: 10.4236/csta.2012.13007.

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The authors declare no conflicts of interest.


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