Modeling of the Absorption of the Electromagnetic Wave Energy in the Human Head Induced by Cell Phone

DOI: 10.4236/jamp.2014.212124   PDF   HTML     2,992 Downloads   3,393 Views   Citations

Abstract

In this paper, we present the Projection Based Interpolation (PBI) technique for construction of continuous approximation of MRI scan data of the human head. We utilize the result of the PBI algorithm to perform three-dimensional (3D) Finite Element Method (FEM) simulations of the heating of the human head induced by cell phone. In particular, we utilize the Pennes equation to describe the bioheat transfer with the right hand side representing the heat generated by cell phone. We utilize our own non-stationary time dependent multi-thread parallel direct solver for the solution of this computational problem. From our numerical results it follows that 15 minutes (1000 seconds) exposure to the cell phone radiation implies up to 2 degrees Celsius increase of the temperature of the brain in the range close to the cell phone.

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Goik, D. , Sieniek, M. , Gurgul, P. and Paszyński, M. (2014) Modeling of the Absorption of the Electromagnetic Wave Energy in the Human Head Induced by Cell Phone. Journal of Applied Mathematics and Physics, 2, 1079-1084. doi: 10.4236/jamp.2014.212124.

Conflicts of Interest

The authors declare no conflicts of interest.

References

[1] Demkowicz, L. (2013) Projection Based Interpolation. The University of Texas, Austin.
[2] Kim, K. (2013) Finite Element Modeling of the Radiation and Induced Hear Transfer in the Human Bodz. Ph.D. Dissertation, The University of Texas, Austin
[3] Sieniek, M., Paszyński, M., Madej, ?. and Goik, D. (2014) Adaptive Projection Based Interpolation as a Pre-Processing Tool in the Finite Element Method Workflow for Elasticity Simulations of the Dual Phase Microstructures. Steel Research International, 85, 1109-1119. http://dx.doi.org/10.1002/srin.201300168
[4] Sieniek, M. and Paszyński, M. (2014) Subtree Reuse in Multi-Frontal Solvers for Regular Grids in Step-and-Flash Imprint Nanolithography Modeling. Advanced Engineering Materials, 16, 231-240. http://dx.doi.org/10.1002/adem.201300267
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