Static and Dynamic Characterization of High-Speed Silicon Carbide (SiC) Power Transistors
Johnson A. Asumadu, James D. Scofield
.
DOI: 10.4236/eng.2010.29087   PDF    HTML     6,978 Downloads   12,262 Views  

Abstract

This paper describes the operating characteristics of NPN 4H-SiC (a polytype of silicon carbide) bipolar junction transistor (BJT) and 4H-SiC Darlington Pairs. A large amount of experimental data was collected. The wafer BJTs were able to block over the rated 600 V in the common-emitter configuration and the TO-220 BJTs were able to block over the 1200 V rated voltage. In the thermal analysis, it is found out that at higher temperatures the forward and reverse (blocking) characteristics were stable at 100°C and 200°C. The transistors show positive temperature coefficients of forward voltage (Vf). In general the current gain (β) characteristics obtained (with VCE = 6 V) were approximately as expected for the BJTs. The β‘s were very low (2 to 5 for wafer BJTs, 5 to 20 for the wafer Darlington Pairs, and 5 to 30 for TO-220 BJTs). The large amount of experimental data collected confirms some of the superior properties of the Silicon carbide material when used to fabricate power semiconductor devices, namely high thermal conductivity and high temperature operability. The data presented here will establish the trends and the performance of silicon carbide devices. The silicon carbide BJT has fast switching and recovery characteristics. From the analysis, silicon carbide power devices will be smaller (about 20 times) than a similar silicon power device and with reduced power losses. Silicon carbide will also be very useful for device integration in high densities, as found in integrated chips for current handling capabilities, for applications in instrumentation and measurements. Presently, most of the research is on improving the basic silicon carbide material quality, power device optimization, and applications engineering using devices that have been developed to date.

Share and Cite:

J. Asumadu and J. Scofield, "Static and Dynamic Characterization of High-Speed Silicon Carbide (SiC) Power Transistors," Engineering, Vol. 2 No. 9, 2010, pp. 673-682. doi: 10.4236/eng.2010.29087.

Conflicts of Interest

The authors declare no conflicts of interest.

References

[1] J. A. Asumadu and J. D. Scofield, “Characteristics of High-Speed Silicon Carbide (SiC) Transistor,” Proceedings of the 24th IEEE Instrumentation and Technology Conference 2007, Vol. 2, 1-3 May 2007, Warsaw, Poland, p. 36.
[2] A. K. Agarwal, S. H. Ryu, J. Richmond, C. Capell, J. W. Palmour, Y. Tang, S. Balachandran and T. P. Chow, “Large Area, 1.3 kV, 17 A, Bipolar Junction Transistor in 4H-SiC,” ISPSD, 2003.
[3] W. J. Choyke and E. D. Palik, “Silicon Carbide (SiC), Handbook of Optical Constants of Solids,” Academic Press, Inc., New York, 1985, pp. 587-595
[4] H. R. Philip and E. A. Taft, “Intrinsic Optical Absorption of in Single Crystal Silicon Carbide,” Silicon Carbide, Eds., J. R. O’Connor and J. Smiltens, New York, Pergamon, 1960, pp. 366-370.
[5] S. Liu and J. D. Scofield, “Thermally Stable Ohmic Contacts to 6H- and 4H- p-Type SiC,” High Temperature Electronics Conference, 1998, HITEC 4th International, San Diego, 14-18 June 1998, pp. 88-92.
[6] M. Bhatnagar and B. J. Baliga, “Comparison of 6H-SiC, 3C-SiC, and Si for Power Devices,” IEEE Transactions on Electron Devices, Vol. 40, No. 4, March 1993, pp. 645 -655.
[7] C. E. Weitzel, J. W. Palmour, C. H. Carter Jr., K. Moore, K. J. Nordquist, S. Allen, C. Thero and M. Bhatnagar, “Silicon Carbide High-Power Devices,” IEEE Transactions on Electron Devices, Vol. 43, No. 10, October 1996, pp. 1732-1741.
[8] W. J. Schaffer, G. H. Negley, K. G. Irvine and J. W. Palmour, “Conductivity Anisotropy in Epitaxial 6H and 4H SiC, in Diamond, and Nitride Wide Bandgap Semi-conductors,” Material Research Society Proceedings, Vol. 339, MRS, Pittsburgh, 1994, pp. 595-600.
[9] S. H. Ryu, A. K. Agarwal, R. Singh and J. W. Palmour, “1800 V NPN Bipolar Junction Transistors in 4H-SiC,” IEEE Electron Device Letters, Vol. 22, No. 1, March 2001, pp. 119-120.
[10] P. Fredricks, H. Mitlehner, K. O. Dohnke, D. Peters, R. Schorner, U. Weinert, E. Baudelot and D. Stephani, “SiC Power Devices With Low On-Resistance for Fast Switching Applications,” IPSD2000, Toulouse, 22-25 May 2000, pp. 213-216.
[11] A. K. Agarwal, S. H. Ryu, C. Capell, J. Richmond, J. W. Palmour, B. Phan, J. Stambaugh, H. Bartlow and K. Brewer, “SiC BJT’s for High Power Switching and RF Applications,” Materials Research Society Symposium Proceedings, Vol. 742, 2003, pp. K7.3.1-K7.3.6.
[12] Y. Tang, J. B. Fedison and T. P. Chow, “An Implanted- Emitter 4H-SiC Bipolar Transistor with High Current Gain,” IEEE Electron Device Letters, Vol. 22, No. 3, March 2001, pp. 119-120.

Copyright © 2024 by authors and Scientific Research Publishing Inc.

Creative Commons License

This work and the related PDF file are licensed under a Creative Commons Attribution 4.0 International License.