Journal of Crystallization Process and Technology

Vol.4 No.4(2014), Paper ID 50286, 8 pages

DOI:10.4236/jcpt.2014.44023

 

Low Pressure Chemical Vapor Deposition of TiO2 Layer in Hydrogen-Ambient

 

Satoshi Yamauchi, Kazuhiro Ishibashi, Sakura Hatakeyama

 

Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan
Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan
Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan

 

Copyright © 2014 Satoshi Yamauchi, Kazuhiro Ishibashi, Sakura Hatakeyama et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

 

How to Cite this Article


Yamauchi, S. , Ishibashi, K. and Hatakeyama, S. (2014) Low Pressure Chemical Vapor Deposition of TiO2 Layer in Hydrogen-Ambient. Journal of Crystallization Process and Technology, 4, 185-192. doi: 10.4236/jcpt.2014.44023.

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