Journal of Water Resource and Protection

Vol.1 No.1(2009), Paper ID 420, 4 pages

DOI:10.4236/jwarp.2009.11008

 

Experimental Study on the Removal of Arsenic in Waste Water from Semiconductor Manufacturing

 

Yue LI, Min XI, Fanlong KONG, Chunyan YU

 

 

Copyright © 2009 Yue LI, Min XI, Fanlong KONG, Chunyan YU et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

 

How to Cite this Article

LI, Y. , XI, M. , KONG, F. and YU, C. (2009) Experimental Study on the Removal of Arsenic in Waste Water from Semiconductor Manufacturing. Journal of Water Resource and Protection, 1, 48-51. doi: 10.4236/jwarp.2009.11008.
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