Crystal Structure Theory and Applications

Vol.2 No.1(2013), Paper ID 29437, 7 pages

DOI:10.4236/csta.2013.21001

 

Plasma-Assisted Chemical Vapor Deposition of TiO2 Thin Films for Highly Hydrophilic Performance

 

Satoshi Yamauchi, Yoh Imai

 

Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan
Department of Electric and Electronic Engineering, Ibaraki University, Hitachi, Japan

 

Copyright © 2013 Satoshi Yamauchi, Yoh Imai et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

 

How to Cite this Article


Yamauchi, S. and Imai, Y. (2013) Plasma-Assisted Chemical Vapor Deposition of TiO2 Thin Films for Highly Hydrophilic Performance. Crystal Structure Theory and Applications, 2, 1-7. doi: 10.4236/csta.2013.21001.

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