Journal of Materials Science and Chemical Engineering
Vol.6 No.1(2018), Paper ID 81572, 6
pages
DOI:10.4236/msce.2018.61003
Formation of Poly-Si Films on Glass Substrates by Using Microwave Plasma Heating and Fabrication of TFT’s on the Films
Hiroki Nakaie, Tetsuji Arai, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa, Kazuki Kamimura, Toshiyuki Takamatsu
Interdisciplinary Graduate School of Medicine and Engineering, University of Yamanashi, Kofu, Japan
Interdisciplinary Graduate School of Medicine and Engineering, University of Yamanashi, Kofu, Japan
Interdisciplinary Graduate School of Medicine and Engineering, University of Yamanashi, Kofu, Japan
Interdisciplinary Graduate School of Medicine and Engineering, University of Yamanashi, Kofu, Japan
Interdisciplinary Graduate School of Medicine and Engineering, University of Yamanashi, Kofu, Japan
Interdisciplinary Graduate School of Medicine and Engineering, University of Yamanashi, Kofu, Japan
SST Inc., Yachiyo, Japan
Copyright © 2018 Hiroki Nakaie, Tetsuji Arai, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa, Kazuki Kamimura, Toshiyuki Takamatsu et al. This is
an open access article distributed under the Creative Commons Attribution
License, which permits unrestricted use, distribution, and reproduction in any
medium, provided the original work is properly cited.
How to Cite this Article
Nakaie, H. , Arai, T. , Arimoto, K. , Yamanaka, J. , Nakagawa, K. , Kamimura, K. and Takamatsu, T. (2018) Formation of Poly-Si Films on Glass Substrates by Using Microwave Plasma Heating and Fabrication of TFT’s on the Films.
Journal of Materials Science and Chemical Engineering,
6, 19-24. doi:
10.4236/msce.2018.61003.