Department of Electrical and Electronics Engineering, Lebanese International University, Beirut, Lebanon
Department of Electrical and Electronics Engineering, Lebanese International University, Beirut, Lebanon
IMS Laboratory, University of Bordeaux, Talence cedex, France
Department of Industrial Engineering, Lebanese International University, Beirut, Lebanon
Copyright © 2017 Ali Mohsen, Adnan Harb, Nathalie Deltimple, Abraham Serhane et al. This is
an open access article distributed under the Creative Commons Attribution
License, which permits unrestricted use, distribution, and reproduction in any
medium, provided the original work is properly cited.
How to Cite this Article
Mohsen, A. , Harb, A. , Deltimple, N. and Serhane, A. (2017) 28-nm UTBB FD-SOI vs. 22-nm Tri-Gate FinFET Review: A Designer Guide—Part I.
Circuits and Systems,
8, 93-110. doi:
10.4236/cs.2017.84006.