Journal of Crystallization Process and Technology

Vol.4 No.1(2014), Paper ID 41733, 7 pages

DOI:10.4236/jcpt.2014.41003

 

Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Layer at Room-Temperature

 

Satoshi Yamauchi, Hiromi Suzuki, Risa Akutsu

 

Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan.
Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan.
Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan.

 

Copyright © 2014 Satoshi Yamauchi, Hiromi Suzuki, Risa Akutsu et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

 

How to Cite this Article


S. Yamauchi, H. Suzuki and R. Akutsu, "Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Layer at Room-Temperature," Journal of Crystallization Process and Technology, Vol. 4 No. 1, 2014, pp. 20-26. doi: 10.4236/jcpt.2014.41003.

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