MEMS and Micro/Nano Systems Laboratory, Department of Physics, Indian Institute of Technology, Hyderabad, India
MEMS and Micro/Nano Systems Laboratory, Department of Physics, Indian Institute of Technology, Hyderabad, India
Copyright © 2013 Prem Pal, Sajal Sagar Singh et al. This is
an open access article distributed under the Creative Commons Attribution
License, which permits unrestricted use, distribution, and reproduction in any
medium, provided the original work is properly cited.
How to Cite this Article
P. Pal and S. Singh, "A New Model for the Etching Characteristics of Corners Formed by Si
{111} Planes on Si
{110} Wafer Surface,"
Engineering, Vol. 5 No. 11A, 2013, pp. 1-8. doi:
10.4236/eng.2013.511A001.