Journal of Surface Engineered Materials and Advanced Technology

Vol.3 No.1A(2013), Paper ID 28528, 6 pages

DOI:10.4236/jsemat.2013.31A009

 

In-Situ Monitoring of Chemical Vapor Deposition from Trichlorosilane Gas and Monomethylsilane Gas Using Langasite Crystal Microbalance

 

Hitoshi Habuka, Yurie Tanaka

 

Department of Chemical and Energy Engineering, Yokohama National University, Yokohama, Japan.
Department of Chemical and Energy Engineering, Yokohama National University, Yokohama, Japan.

 

Copyright © 2013 Hitoshi Habuka, Yurie Tanaka et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

 

How to Cite this Article


Habuka, H. and Tanaka, Y. (2013) In-Situ Monitoring of Chemical Vapor Deposition from Trichlorosilane Gas and Monomethylsilane Gas Using Langasite Crystal Microbalance. Journal of Surface Engineered Materials and Advanced Technology, 3, 61-66. doi: 10.4236/jsemat.2013.31A009.

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