Journal of Surface Engineered Materials and Advanced Technology
Vol.3 No.1A(2013), Paper ID 28528, 6 pages
DOI:10.4236/jsemat.2013.31A009
In-Situ Monitoring of Chemical Vapor Deposition from Trichlorosilane Gas and Monomethylsilane Gas Using Langasite Crystal Microbalance
Hitoshi Habuka, Yurie Tanaka
Department of Chemical and Energy Engineering, Yokohama National University, Yokohama, Japan. Department of Chemical and Energy Engineering, Yokohama National University, Yokohama, Japan.
Copyright © 2013 Hitoshi Habuka, Yurie Tanaka et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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