Journal of Modern Physics

Vol.4 No.2(2013), Paper ID 27897, 11 pages

DOI:10.4236/jmp.2013.42030

 

Dust Plasma Effect on the Etching Process of Si[100] by Ultra Low Frequency RF Plasma

 

Ahmed Rida Galaly, Farouk Fahmi Elakshar

 

Engineering Science Department, Faculty of Community, Umm Al-Qura University, Mecca, Saudi Arabia
Physics Department, Faculty of Science, Al-Azhar University, Cairo, Egypt

 

Copyright © 2013 Ahmed Rida Galaly, Farouk Fahmi Elakshar et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

 

How to Cite this Article


A. Galaly and F. Elakshar, "Dust Plasma Effect on the Etching Process of Si[100] by Ultra Low Frequency RF Plasma," Journal of Modern Physics, Vol. 4 No. 2, 2013, pp. 215-225. doi: 10.4236/jmp.2013.42030.

Copyright © 2020 by authors and Scientific Research Publishing Inc.

Creative Commons License

This work and the related PDF file are licensed under a Creative Commons Attribution 4.0 International License.