has been cited by the following article(s):
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[1]
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Prediction of Wafer Handling-Induced Point Defects in 300 mm Silicon Wafer Manufacturing from Edge Geometric Data
Solid State Phenomena,
2023
DOI:10.4028/p-bLt8mu
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[2]
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Water Flow Improvement by Pinhole Outlet in Batch-Type Wet Cleaning Bath for Large-Diameter Wafers
ECS Journal of Solid State Science and Technology,
2022
DOI:10.1149/2162-8777/ac7bf0
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[3]
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Numerical Simulation of an Entire Wafer Surface during Ozone-Based Wet Chemical Etching
Industrial & Engineering Chemistry Research,
2020
DOI:10.1021/acs.iecr.0c03382
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[4]
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Side wall water outlet design for silicon wafer wet cleaning bath
Materials Science in Semiconductor Processing,
2020
DOI:10.1016/j.mssp.2020.104970
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[5]
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Numerical Simulation of an Entire Wafer Surface during Ozone-Based Wet Chemical Etching
Industrial & Engineering Chemistry Research,
2020
DOI:10.1021/acs.iecr.0c03382
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[6]
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Fluid Dynamic Modeling and Flow Visualization of an Industrial Wet Chemical Process Bath
IEEE Transactions on Semiconductor Manufacturing,
2019
DOI:10.1109/TSM.2019.2917083
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[7]
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Water Outlet Design of Wet Cleaning Bath for 300-mm Diameter Silicon Wafers
ECS Journal of Solid State Science and Technology,
2018
DOI:10.1149/2.0171809jss
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