Journal of Crystallization Process and Technology

Journal of Crystallization Process and Technology

ISSN Print: 2161-7678
ISSN Online: 2161-7686
www.scirp.org/journal/jcpt
E-mail: jcpt@scirp.org
"Low Pressure Chemical Vapor Deposition of TiO2 Layer in Hydrogen-Ambient"
written by Satoshi Yamauchi, Kazuhiro Ishibashi, Sakura Hatakeyama,
published by Journal of Crystallization Process and Technology, Vol.4 No.4, 2014
has been cited by the following article(s):
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[1] Interface Engineering of Pb–Sn Low‐Bandgap Perovskite Solar Cells for Improved Efficiency and Stability
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[2] Hydraulic pressure and temperature effects on the structural, morphological and electrical properties of SeO2 powders
Applied Physics A, 2022
[3] Engineering structure and functionalities of chemical vapor deposited photocatalytic titanium dioxide films through different types of precursors
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[4] TiO 2/Bi 2 S 3 ball-and-stick structure heterojunction prepared on FTO glass as a photoanode for solar cells
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[5] Propriétés structurales, optiques et électriques d'hétérojonctions Co3O4-TiO2 déposées par MOCVD pour l'étude de la production de dihydrogène par dissociation …
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[6] Propriétés structurales, optiques et électriques d'hétérojonctions Co3O4/TiO2 déposées par MOCVD pour l'étude de la production de dihydrogène par dissociation …
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[7] Разработка комплекса нелинейных систем управления ионно-плазменной установкой
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[8] TiO2/Bi2S3 ball-and-stick structure heterojunction prepared on FTO glass as a photoanode for solar cells
Journal of the Iranian Chemical Society, 2018
[9] Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films
Scientific Reports, 2018
[10] DESIGN OF A SET OF NONLINEAR CONTROL SYSTEMS OF THE ARC PVD ION-PLASMA INSTALLATION
2018
[11] Metal oxide and metal oxide-silica thin films deposited by low pressure plasma process: Comparative study of films obtained from Zirconium (IV) tert-Butoxide and …
2018
[12] Couches minces d'oxydes métalliques et d'oxydes métalliques-siliciés déposées par procédé plasma basse pression: étude comparative des couches réalisées à …
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[13] Enhanced Photo-Induced Property of LPCVD-TiO2 Layer on PCVD-TiOx Initial Layer
Journal of Materials Science and Chemical Engineering, 2015
[14] Low Resistive TiO 2 Deposition by LPCVD Using TTIP and NbF 5 in Hydrogen-Ambient
2014
[15] Drastic Resistivity Reduction of CVD-TiO 2 Layers by Post-Wet-Treatment in HCl Solution
2014
[16] Low Resistive TiO2 Deposition by LPCVD Using TTIP and NbF5 in Hydrogen-Ambient
Journal of Crystallization Process and Technology, 2014
[17] Drastic Resistivity Reduction of CVD-TiO2 Layers by Post-Wet-Treatment in HCl Solution
Journal of Crystallization Process and Technology, 2014
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