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Photocuring Behaviors of UV-Curable Perfluoropolyether-Based Fluoropolymers with and without Tertiary Amine

DOI: 10.4236/ojopm.2014.41002    4,174 Downloads   6,555 Views  

ABSTRACT

UV-curable perfluoropolyether (PFPE)-based fluoropolymer (PFPE-DMA) was synthesized and the photocuring behaviors of PFPE-DMA/HDDA systems with and without tertiary triethyl amine (TEA) were investigated using photo-DSC under air and nitrogen atmospheres. Photo-DSC analysis revealed that N2 purging and the presence of TEA mitigated oxygen inhibition in the photopolymerization of the UV-curable free-radical PFPE-DMA/ HDDA system. In addition, TEA synergistically acted as a coinitiator or photosynergist under nitrogen atmosphere, which increased the cure rate and percentage conversion for the photopolymerization of PFPE-DMA/ HDDA. TEA acted as both oxygen scavenger and photosynergist. The results presented here demonstrate that investigating the photocuring behaviors of PFPE-DMA/HDDA systems is very helpful to determine the optimal curing conditions for the PFPE-DMA fluoropolymer.

Conflicts of Interest

The authors declare no conflicts of interest.

Cite this paper

Cho, J. , Kim, D. and Hong, J. (2014) Photocuring Behaviors of UV-Curable Perfluoropolyether-Based Fluoropolymers with and without Tertiary Amine. Open Journal of Organic Polymer Materials, 4, 6-9. doi: 10.4236/ojopm.2014.41002.

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