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https://doi.org/10.1021/ja0493188

has been cited by the following article:

• TITLE: Dye Regeneration Kinetics of C343-Sensitized Nickel Oxide Investigated by Scanning Electrochemical Microscopy

  AUTHORS: Anshebo Getachew Alemu

  KEYWORDS: Nanoprecipitation, PLA, Clove Oil, Antioxidant

  JOURNAL NAME: Materials Sciences and Applications, Vol.13 No.1, January 21, 2022

  ABSTRACT: Scanning electrochemical microscopy (SECM) feedback mode has been used to investigate kinetics of dye regeneration in DSSC. Organic dye C343 and CW1 are used as sensitizers for nickel oxide (NiO) photoelectrochemical cells. The influence of film thickness on dye regeneration kinetics in the films for NiO/C343 for six different films was investigated. SECM was used to analyze effective rate constant, keff and reduction rate kred, absorption cross section, Φhv for the dye regeneration process. The data reveal a significant variation of keff and kred with a variation of light intensity, sample thickness and dye difference. This research found remarkable dependence of the dye regeneration kinetic parameters on illumination flux, dye types and film thickness of electrode.