Shi, Z.F., Wang, Y.J., Du, C., Huang, N., Wang, L. and Nung, C.Y. (2011) The Structure, Surface Topography and Mechanical Properties of Si-C-N Films Fabricated by RF and DC Magnetron Sputtering. Applied Surface Science, 258, 1328-1336.
https://doi.org/10.1016/j.apsusc.2011.09.036

has been cited by the following article:

• TITLE: Laser-Plasma Deposition of Silicon Carbonitride Films by the HMDS Vapor Gas Flow Activation after a Laser Beam Focus

  AUTHORS: V. N. Demin, V. O. Borisov, G. N. Grachev, A. L. Smirnov, M. N. Khomyakov, S. N. Bagayev

  KEYWORDS: Laser-Plasma Deposition, Hard Coating, Silicon Carbonitride Films

  JOURNAL NAME: Advances in Materials Physics and Chemistry, Vol.11 No.7, July 16, 2021

  ABSTRACT: A new laser-plasma deposition method has been developed for the plasma chemical deposition of hard silicon carbonitride coatings on stainless steel substrates from the hexamethyldisilazane (HMDS) Si2NH(CH3)6 vapor in a high-speed Ar and Ar + 10 vol.% He gas stream at the HMDS gas flow activation after the laser beam focus. The method allows depositing silicon carbonitride coatings at the rate of 0.4 - 1.2 μm·min-1, i.e. ~2 times higher than that at introducing HMDS in the laser beam focus zone. The properties of the prepared coatings have been studied by the methods of IR and Raman spectroscopy, atomic force microscopy, nanoindentation and X-ray diffraction (XRD) analysis. Studying the film structure with the use of XRD showed that the prepared silicon carbonitride coatings are X-ray amorphous. It has been found that the coating deposition rate and the structure of coatings depend on the process parameters: HMDS flow rate and plasma-generating gas (argon or (Ar + He). The method allows depositing SiCN films at a high speed and a hardness of 20 - 22 GPa.