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E. P. Bogolyubov, V. D. Bochkov, V. A. Veretennikov, L. T. Vekhoreva, V. A. Gribkov, A. V. Dubrovskii, P. Ivanov Yu, A. I. Isakov, O. N. Krokhin, P. Lee, S. Lee, V. Ya Nikulin, A. Serban, P. V. Silin, X. Feng, and G. X. Zhang, “A powerful soft x-ray source for x-ray lithography based on plasma focusing,” Physica Scripta, Vol. 57, pp. 488– 494, 1998.

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