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Duy, N.V., Jung, S.W., Nga, N.T., Son, D.N., Cho, J.H., Lee, S.H., Lee, W.B. and Yi, J.S. (2010) The Investigation of an Amorphous SiOx System for Charge Storage Applications in Nonvolatile Memory at Low Temperature Process. Materials Science and Engineering: B, 175, 176-180.
http://dx.doi.org/10.1016/j.mseb.2010.07.009

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