Vakaryuk, T.Ye., Gromovoi, Yu.S., Danko, V.A., Dorozinsky, G.V., Zynio, S.A., Indutnyi, I.Z., Samoylov, A.V., Ushenin, Yu.V., Khristosenko, R.V. and Shepeliavyi, P.Ye. (2013) Application of Porous SiOx Films in Sensors Based on Surface Plasmon Resonance. Optoelektronika i Poluprovodnikovaya Tekhnika, No 48, 89-95.

has been cited by the following article:

• TITLE: Influence of Technological Factors on Sensitivity of Analytical Devices Based on Surface Plasmon Resonance

  AUTHORS: Glib Dorozinsky, Tamara Doroshenko, Volodymyr Maslov

  KEYWORDS: Deposition Technology, Optical Sensor, Surface Plasmon Resonance, Sensitivity of Devices

  JOURNAL NAME: Journal of Sensor Technology, Vol.5 No.2, June 3, 2015

  ABSTRACT: Considered in this paper are the factors influencing sensitivity of analytical devices based on surface plasmon resonance phenomenon. The decrease in temperature influence on sensitivity of these devices can be reached using thermo stabilization of the whole device with flow cells for studied substances. Adduced here are some results concerning the influence of deposition geometry for nano-dimensional gold layer covering the surface of operating element on sensitivity of these devices.