TITLE:
Extendibility Evaluation of Industrial EUV Source Technologies for kW Average Power and 6.x nm Wavelength Operation
AUTHORS:
Akira Endo
KEYWORDS:
EUV; LPP; High Power; BEUV; FEL; Super Conducting Accelerator
JOURNAL NAME:
Journal of Modern Physics,
Vol.5 No.5,
March
31,
2014
ABSTRACT:
Interests
in the extendibility are growing after the introduction of the LPP (Laser
Produced Plasma) EUV source technology in the semiconductor industry, towards
higher average power and shorter wavelength, based on the basic architecture of
the established LPP EUV source technology. It is discussed in this article that
the power scaling of the 13.5nm wavelength source is essentially possible by a
slight increase of the driving laser power, CE (Conversion Efficiency) and EUV
collection efficiency by some introduction of novel component technologies.
Extension of the EUV wavelength towards BEUV (Beyond EUV), namely 6.x nm is
discussed based on the general rule of the UTA (Unresolved Transition Arrays)
of high Z ions, and development of multilayer mirrors in this particular
wavelength region. Technical difficulties are evaluated for the extension of
the LPP source technology by considering the narrower mirror bandwidth and
higher melting temperature of the candidate plasma materials. Alternative approach
based on the superconducting FEL is evaluated in comparison with the LPP source
technology for the future solution.