Kurosawa, M., Toko, K., Kawabata, N., Sadoh, T. and Miyao, M. (2011) Al-Induced Oriented-Crystallization of Si Films on Quartz and Its Application to Epitaxial Template for Ge Growth. Solid-State Electronics, 60, 7-12.
https://doi.org/10.1016/j.sse.2011.01.033

has been cited by the following article:

• TITLE: The Larger Grain and (111)-Orientation Planes of Poly-Ge Thin Film Grown on SiO2 Substrate by Al-Induced Crystallization

  AUTHORS: Shaoguang Dong, Junhuo Zhuang, Yaguang Zeng

  KEYWORDS: Al-Induced Crystallization, Poly-Ge Thin Film, Diffusion Control Interlayer, Lower Annealing Temperature

  JOURNAL NAME: Journal of Materials Science and Chemical Engineering, Vol.6 No.2, February 13, 2018

  ABSTRACT: Al-induced crystallization yields the larger grain and (111)-orientation planes of poly-Ge thin film grown on SiO2 substrate, the (111)-orientation planes of poly-Ge thin film grown on SiO2 substrate are very important for the superior performance electronics and solar cells. We discussed the 50 nm thickness poly-Ge thin film grown on SiO2 substrate by Alinduced crystallization focusing on the lower annealing temperature and the diffusion control interlayer between Ge and Al thin film. The (111)-orientation planes ratio of poly-Ge thin film achieve as high as 90% by merging the lower annealing temperature (325℃) and the GeOx diffusion control interlayer. Moreover, we find the lack of defects on poly-Ge thin film surface and the larger average grains size of poly-Ge thin film over 12 μm were demonstrated by electron backscatter diffraction measurement. Our results turn on the feasibility of fabricating electronic and optical device with poly-Ge thin film grown on SiO2 substrate.