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Van Hemmen, J.L., Heil, S.B.S., Klootwijk, J.H., Roozeboom, F., Hodson, C.J., van de Sanden, M.C.M. and Kessels, W.M.M. (2007) Plasma and Thermal ALD of Al2O3 in a Commercial 200 mm ALD Reactor. Journal of the Electrochemical Society, 154, G165-G169. http://jes.ecsdl.org/content/154/7/G165
http://dx.doi.org/10.1149/1.2737629

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