Miura, K., Arai, Y., Osawa, T. and Hanaizumi, O. (2012) Light-Emission Properties of Europium-Doped Tantalum-Oxide Thin Films Deposited by Radio-Frequency Magnetron Sputtering. Journal of Light & Visual Environment, 36, 64-67.
http://dx.doi.org/10.2150/jlve.36.64

has been cited by the following article:

• TITLE: Photoluminescence and Crystalline Properties of CuO-Ta2O5 Composite Films Prepared Using Co-Sputtering

  AUTHORS: Kenta Miura, Takumi Osawa, Yuya Yokota, Osamu Hanaizumi

  KEYWORDS: Ta2O5, CuO, Co-Sputtering, Photoluminescence, X-Ray Diffraction

  JOURNAL NAME: Open Access Library Journal, Vol.2 No.11, November 10, 2015

  ABSTRACT: We prepared CuO-Ta2O5 composite films by our simple co-sputtering method using three CuO pellets and a Ta2O5 disc as a co-sputtering target, and subsequently annealed the films in ambient air at 900℃, 1000℃, and 1100℃ for 20 min. We evaluated photoluminescence (PL) and X-ray diffraction properties of the annealed films, and discussed the relationship between sharp PL peaks (λ ~ 450 nm) observed from all the films and their crystallizabilities. We considered that the 450-nm peaks originated from Cu2.1(Ta4O12) crystal phases in the films.