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Vieu, C., Carcenac, F., Pépin, A., Chen, Y., Mejias, M., Lebib, A., Manin-Ferlazzo, L., Couraud, L. and Launois, H. (2000) Electron Beam Lithography: Resolution Limits and Applications. Applied Surface Science, 164, 111-117.
http://dx.doi.org/10.1016/S0169-4332(00)00352-4

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