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An, Q.Z., Li, L.H., Hu, T., Xin, Y.C., Fu, R.K.Y., Kwok, D.T.K., Cai, X. and Chu, P.K. (2009) Comparison of Oxidation Resistance of Copper Treated by Beam-Line Ion Implantation and Plasma Immersion Ion Implantation. Materials Chemistry and Physics, 16, 519-522.
http://dx.doi.org/10.1016/j.matchemphys.2009.04.023

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