Miura, K., Arai, Y., Kano, K. and Hanaizumi, O. (2015) Fabrication of Erbium and Ytterbium Co-Doped Tantalum-Oxide Thin Films Using Radio-Frequency Co-Sputtering. Materials Sciences and Applications, 6, 343-347.
http://dx.doi.org/10.4236/msa.2015.65039

has been cited by the following article:

• TITLE: Observation of Violet-Light Emission Band for Thulium-Doped Tantalum-Oxide Films Produced by Co-Sputtering

  AUTHORS: Kenta Miura, Tetsuhito Suzuki, Osamu Hanaizumi

  KEYWORDS: Tantalum Oxide, Thulium, Co-Sputtering, Violet-Light Emission Band

  JOURNAL NAME: Materials Sciences and Applications, Vol.6 No.7, July 14, 2015

  ABSTRACT: We prepared thulium-doped tantalum (V) oxide (Ta2O5:Tm) thin films using co-sputtering of two Tm2O3 pellets and a Ta2O5 disc, and we observed photoluminescence (PL) peaks not only around a wavelength of 800 nm due to the 3H4→3H6 transition of Tm3+ but also around a wavelength of 400 nm (violet) from the films after annealing for the first time. Comparatively narrow PL peaks around the wavelength of 400 nm were observed from the films annealed at 800°C and 900°C for 20 min. The peak intensity from the film annealed at 900°C was approximately four-times stronger than that from the film annealed at 800°C. The origin of the 400-nm peaks seems to be the same as our non-doped Ta2O5 thin films deposited using radio-frequency sputtering because we observe PL peaks around 400 - 430 nm from the Ta2O5 films. Such a Ta2O5:Tm co-sputtered thin film seems to be used as a multi-functional coating film having both anti-reflection and down-conversion effects for realizing a high-efficiency silicon solar cell.