Bragg-Angle Diffraction in Slant Gratings Fabricated by Single-Beam Interference Lithography

Xinping Zhang, Shengfei Feng, Tianrui Zhai

College of Applied Sciences, Beijing University of Technology, Beijing, China.

DOI: 10.4236/opj.2012.21003                

Abstract

A single-beam interference-lithography scheme is demonstrated for the fabrication of large-area slant gratings, which requires exposure of the photoresist thin film spin-coated on a glass plate with polished side-walls to a single laser beam in the ultraviolet and requires small coherence length of the laser. No additional beam splitting scheme and no adjustments for laser-beam overlapping and for optical path-length balancing are needed. Bragg-angle diffractions are observed as strong optical extinction that is tunable with changing the angle of incidence. This device is important for the design of efficient filters, beam splitters, and photonic devices.

Keywords

Slant Grating; Single-Beam Interference Lithography; Bragg-Angle Diffraction

Conflicts of Interest

The authors declare no conflicts of interest.

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