Open Journal of Forestry

Volume 5, Issue 1 (January 2015)

ISSN Print: 2163-0429   ISSN Online: 2163-0437

Google-based Impact Factor: 0.90  Citations  

Influence of Residual Basal Area on Longleaf Pine (Pinus palustris Mill.) First Year Germination and Establishment under Selection Silviculture

HTML  XML Download Download as PDF (Size: 3821KB)  PP. 10-20  
DOI: 10.4236/ojf.2015.51002    3,049 Downloads   3,929 Views  Citations

ABSTRACT

Even-aged silvicultural methods have been successfully used to manage longleaf pine (Pinus palustris Mill.) forests for wood production; however, successful use of uneven-aged methods to manage this ecosystem is less well documented. In this study, the effects of varying levels of residual basal area (RBA) (9.2, 13.8, and 18.4 m2·ha-1) on longleaf pine germination and establishment under selection silviculture marked using the Proportional-B method were observed. In addition to RBA, photosynthetically active radiation (PAR) was measured, and the relationships between light penetration, germination, and growth were examined. The study found an inverse relationship between RBA and the number of germinants, but the mortality of germinants was not influenced by RBA. PAR also had a significant positive effect on germination, but, did not affect mortality of germinants. In addition, RBA and PAR had no effect on mortality or growth of planted seedlings. Continued monitoring of seedling recruitment into the stand will be required to determine the efficacy of the system. However, nothing in the first year data suggests that this approach will not be successful in sustaining an uneven-aged stand.

Share and Cite:

Kara, F. and Loewenstein, E. (2015) Influence of Residual Basal Area on Longleaf Pine (Pinus palustris Mill.) First Year Germination and Establishment under Selection Silviculture. Open Journal of Forestry, 5, 10-20. doi: 10.4236/ojf.2015.51002.

Copyright © 2024 by authors and Scientific Research Publishing Inc.

Creative Commons License

This work and the related PDF file are licensed under a Creative Commons Attribution 4.0 International License.